半导体材料

半导体材料是一类固体材料,其導電性介于导体绝缘体之间,屬於半導體

发展

  • 1833年,英國的法拉第發現硫化銀是半導體材料,因為它的電阻隨著溫度上升而降低。
  • 1874年,德國的布勞恩注意到硫化物的電導率與所加電壓的方向有關,這就是半導體的整流作用。
  • 1947年12月23日,巴丁布拉坦進一步使用點接觸電晶體製作出一個語音放大器,電晶體正式發明。
  • 1958年9月12日,美國的基尔比,細心地切了一塊作為電阻,再用一塊pn接面做為電容,製造出一個震盪器電路。

分类

以原料分为:

列表

半導體材料列表
元素化學式能隙 (eV)直接帶隙和間接帶隙
IV1Si1.12[1][2]間接带隙
IV1GermaniumGe0.67[1][2]間接帶隙
IV1Material properties of diamondC5.47[1][2]間接帶隙
IV1, α-SnSn0[3][4]半金属 (能带理论)
IV2碳化硅, 3C-SiCSiC2.3[1]間接帶隙
IV2碳化硅, 4H-SiCSiC3.3[1]間接帶隙
IV2碳化硅, 6H-SiCSiC3.0[1]間接帶隙
VI1, 硫的同素异形体S82.6[5]
VI1Se1.83 - 2.0[6]間接帶隙
VI1Se2.05間接帶隙
VI1Te0.33[7]
III-V2氮化硼, cubicBN6.36[8]間接帶隙
III-V2氮化硼, hexagonalBN5.96[8]quasi-direct
III-V2氮化硼BN5.5[9]
III-V2磷化硼BP2.1[10]間接帶隙
III-V2砷化硼BAs1.82直接帶隙
III-V2砷化硼B12As23.47間接帶隙
III-V2氮化鋁AlN6.28[1]直接帶隙
III-V2磷化铝AlP2.45[2]間接帶隙
III-V2砷化铝AlAs2.16[2]間接帶隙
III-V2锑化铝AlSb1.6/2.2[2]直接帶隙/direct
III-V2氮化鎵GaN3.44[1][2]直接帶隙
III-V2磷化鎵GaP2.26[1][2]間接帶隙
III-V2Gallium arsenideGaAs1.42[1][2]直接帶隙
III-V2銻化鎵GaSb0.73[1][2]直接帶隙
III-V2氮化銦InN0.7[1]直接帶隙
III-V2磷化銦InP1.35[1]直接帶隙
III-V2砷化铟InAs0.36[1]直接帶隙
III-V2锑化铟InSb0.17[1]直接帶隙
II-VI2硒化镉CdSe1.74[2]直接帶隙
II-VI2硫化镉CdS2.42[2]直接帶隙
II-VI2碲化镉CdTe1.49[2]直接帶隙
II-VI2氧化鋅ZnO3.37[2]直接帶隙
II-VI2硒化锌ZnSe2.7[2]直接帶隙
II-VI2硫化锌ZnS3.54/3.91[2]直接帶隙
II-VI2碲化锌ZnTe2.3[2]直接帶隙
I-VII2氯化亚铜CuCl3.4[11]直接帶隙
I-VI2Copper sulfideCu2S1.2[10] 間接帶隙
IV-VI2硒化铅PbSe0.26[7]直接帶隙
IV-VI2硫化铅PbS0.37[12]
IV-VI2碲化铅PbTe0.32[1]
IV-VI2硫化亚锡SnS1.3/1.0[13]直接帶隙/間接帶隙
IV-VI2二硫化锡SnS22.2[14]
IV-VI2碲化亚锡SnTe0.18
IV-VI3Lead tin telluridePb1−xSnxTe0-0.29
V-VI2碲化鉍Bi2Te30.13[1]
II-V2磷化镉Cd3P20.5[15]
II-V2砷化鎘Cd3As20
II-V2磷化锌Zn3P21.5[16]直接帶隙
II-V2二磷化锌ZnP22.1[17]
II-V2砷化锌Zn3As21.0[18]
II-V2锑化锌Zn3Sb2
2二氧化鈦, 锐钛矿TiO23.20[19]間接帶隙
2二氧化鈦, 金红石TiO23.0[19]直接帶隙
2二氧化鈦, 板鈦礦TiO23.26[19]
2氧化亚铜Cu2O2.17[20]
2氧化铜CuO1.2
2二氧化鈾UO21.3
2二氧化锡SnO23.7
3钛酸钡BaTiO33
3钛酸锶SrTiO33.3
3铌酸锂LiNbO34
V-VI2monoclinic 二氧化钒VO20.7[21]光學帶隙
2碘化鉛PbI22.4[22]
2二硫化钼MoS21.23 eV (2H)[23]間接帶隙
2Gallium(II) selenideGaSe2.1間接帶隙
2 硒化铟 InSe 1.26-2.35 eV[24] 直接帶隙 (2D間接帶隙)
2硫化亚锡SnS>1.5 eV直接帶隙
2硫化铋Bi2S31.3[1]
Magnetic, diluted (DMS)[25]3Gallium manganese arsenideGaMnAs
Magnetic, diluted (DMS)3Lead manganese telluridePbMnTe
4Lanthanum calcium manganateLa0.7Ca0.3MnO3
2氧化亚铁FeO2.2 [26]
2一氧化镍NiO3.6–4.0直接帶隙[27][28]
2Europium(II) oxideEuO
2硫化亚铕EuS
2溴化铬CrBr3
其它3Copper indium selenide, CISCuInSe21直接帶隙
其它3Silver gallium sulfideAgGaS2
其它3Zinc silicon phosphideZnSiP22.0[10]
其它2三硫化二砷 雌黃As2S32.7[29]直接帶隙
其它2硫化砷 雄黄As4S4
其它2Platinum silicidePtSi
其它2碘化铋BiI3
其它2碘化汞HgI2
其它2溴化亚铊TlBr2.68[30]
其它2硫化银Ag2S0.9[31]
其它2Iron disulfideFeS20.95[32]
其它4Copper zinc tin sulfide, CZTSCu2ZnSnS41.49直接帶隙
其它4Copper zinc antimony sulfide, CZASCu1.18Zn0.40Sb1.90S7.22.2[33]直接帶隙
其它3Copper tin sulfide, CTSCu2SnS30.91[10]直接帶隙

合金表

半導體材料合金列表
元素 材料 化學式 能隙 (eV) 直接帶隙和間接帶隙
IV-VI3Lead tin telluridePb1−xSnxTe00.29
IV2矽鍺Si1−xGex0.671.11[1]直接帶隙/間接帶隙
IV2Silicon-tinSi1−xSnx1.01.11間接帶隙
III-V3Aluminium gallium arsenideAlxGa1−xAs1.422.16[1]直接帶隙/間接帶隙
III-V3Indium gallium arsenideInxGa1−xAs0.361.43直接帶隙
III-V3磷化銦鎵InxGa1−xP1.352.26直接帶隙/間接帶隙
III-V3Aluminium indium arsenideAlxIn1−xAs0.362.16直接帶隙/間接帶隙
III-V3Aluminium gallium antimonideAlxGa1−xSb0.71.61直接帶隙/間接帶隙
III-V3Aluminium indium antimonideAlxIn1−xSb0.171.61直接帶隙/間接帶隙
III-V3Gallium arsenide nitrideGaAsN
III-V3Gallium arsenide phosphideGaAsP1.432.26直接帶隙/間接帶隙
III-V3Aluminium arsenide antimonideAlAsSb1.612.16間接帶隙
III-V3Gallium arsenide antimonideGaAsSb0.71.42[1]直接帶隙
III-V3Aluminium gallium nitrideAlGaN3.446.28直接帶隙
III-V3Aluminium gallium phosphideAlGaP2.262.45間接帶隙
III-V3Indium gallium nitrideInGaN23.4直接帶隙
III-V3Indium arsenide antimonideInAsSb0.170.36直接帶隙
III-V3Indium gallium antimonideInGaSb0.170.7直接帶隙
III-V4Aluminium gallium indium phosphideAlGaInP直接帶隙/間接帶隙
III-V4Aluminium gallium arsenide phosphideAlGaAsP
III-V4Indium gallium arsenide phosphideInGaAsP
III-V4Indium gallium arsenide antimonideInGaAsSb
III-V4Indium arsenide antimonide phosphideInAsSbP
III-V4Aluminium indium arsenide phosphideAlInAsP
III-V4Aluminium gallium arsenide nitrideAlGaAsN
III-V4Indium gallium arsenide nitrideInGaAsN
III-V4Indium aluminium arsenide nitrideInAlAsN
III-V4Gallium arsenide antimonide nitrideGaAsSbN
III-V5Gallium indium nitride arsenide antimonideGaInNAsSb
III-V5Gallium indium arsenide antimonide phosphideGaInAsSbP
II-VI3碲化鋅鎘, CZTCdZnTe1.42.2直接帶隙
II-VI3Mercury cadmium tellurideHgCdTe01.5
II-VI3Mercury zinc tellurideHgZnTe02.25
II-VI3Mercury zinc selenideHgZnSe
II-V4Zinc cadmium phosphide arsenide(Zn1−xCdx)3(P1−yAsy)2[34]0[35]1.5[36]
其它4Copper indium gallium selenide, CIGSCu(In,Ga)Se211.7直接帶隙

參見

參考文獻

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